AMAT Applied Materials 0010-99060氣體面板
1.產(chǎn) 品 資 料 介 紹：
- 多氣體通道集成管控：采用模塊化設(shè)計，集成至少 6-8 路獨立氣體通道，可同時管控不同類型的工藝氣體（如刻蝕工藝中的 CF?、O?，沉積工藝中的 SiH?、NH?）。每路通道均配備獨立的截止閥、過濾器與壓力調(diào)節(jié)單元，支持氣體種類靈活切換，滿足多工藝步驟的氣體供應(yīng)需求，通道間隔離度高，可有效防止氣體交叉污染。
- 高精度壓力與流量控制：搭載進口高精度壓力 regulators（如 Swagelok、Parker 品牌），壓力調(diào)節(jié)范圍覆蓋 0.1-10bar，調(diào)節(jié)精度 ±0.5% FS（滿量程），可將輸入氣體壓力穩(wěn)定在工藝所需的精準(zhǔn)范圍，避免壓力波動影響工藝穩(wěn)定性；同時每路通道可兼容 Mass Flow Controller（MFC，質(zhì)量流量控制器），支持流量范圍 0-500sccm（標(biāo)準(zhǔn)毫升 / 分鐘），流量控制精度 ±1% FS，實現(xiàn)對氣體流量的實時精準(zhǔn)調(diào)控。
- 多層級氣體凈化過濾：每路氣體通道依次配備三級過濾單元，第一級為 5μm 粗過濾器，過濾氣體中的大顆粒雜質(zhì)；第二級為 0.1μm 精密過濾器，去除微小顆粒；第三級為化學(xué)吸附過濾器，可吸附氣體中的水分（露點≤-80℃）、氧氣（含量≤1ppb）及有機雜質(zhì)，確保輸出氣體純度達到 99.9999%（6N 級）以上，滿足半導(dǎo)體先進制程（如 7nm 及以下）對氣體潔凈度的要求。
- 全方位安全防護設(shè)計：具備多重安全保護功能，包括過壓保護（當(dāng)氣體壓力超過設(shè)定閾值 1.2 倍時，自動開啟泄壓閥）、泄漏檢測（集成高精度氣體泄漏傳感器，檢測精度≤1×10??mbar?L/s，泄漏時立即關(guān)閉對應(yīng)通道截止閥并觸發(fā)報警）、緊急切斷（配備緊急切斷按鈕，發(fā)生緊急情況時可一鍵切斷所有氣體供應(yīng)）；同時面板外殼采用耐腐蝕不銹鋼材質(zhì)（316L），具備良好的抗化學(xué)腐蝕性能，適應(yīng)半導(dǎo)體車間的化學(xué)環(huán)境。
- 智能化監(jiān)控與集成：配備高清 LCD 顯示屏，可實時顯示每路氣體的壓力、流量、過濾狀態(tài)等參數(shù)；支持 RS-485/EtherNet 通信接口，可無縫接入 AMAT 主設(shè)備控制系統(tǒng)（如 Centura、Producer 系列）及工廠 MES 系統(tǒng)，實現(xiàn)氣體供應(yīng)參數(shù)的遠程監(jiān)控、數(shù)據(jù)記錄與歷史追溯；同時具備故障自診斷功能，可自動識別過濾器堵塞、閥門故障等問題，并通過聲光報警提示，便于及時維護。
AMAT Applied Materials 0010-99060氣體面板 英文資料：
1、 Core positioning and system of the product
The 0010-99060 gas panel is a core control component in the semiconductor equipment process gas supply system of Applied Materials Company (AMAT), belonging to the "high-precision gas delivery and control" product line. In the semiconductor manufacturing process, the purity, flow rate, pressure and other parameters of process gases directly affect the quality of chip manufacturing. As a "process gas manager", this gas panel is mainly suitable for key process equipment such as wafer etching, thin film deposition (CVD/PVD), ion implantation, etc. By centrally filtering, stabilizing, regulating and safely controlling various process gases (such as reaction gases, carrier gases, cleaning gases), it provides stable, clean and accurate gas supply for equipment, which is a key link to ensure the stability of semiconductor processes and chip yield.
2、 Analysis of core functions and technical characteristics
Based on the strict requirements of semiconductor technology for gas supply and the application scenarios of this gas panel, its core functions and technical characteristics can be broken down in detail into the following points:
Multi gas channel integrated control: adopting modular design, integrating at least 6-8 independent gas channels, which can simultaneously control different types of process gases (such as CF ?, O ? in etching process, SiH ?, NH ∝ in deposition process). Each channel is equipped with independent shut-off valves, filters, and pressure regulating units, supporting flexible switching of gas types to meet the gas supply needs of multiple process steps. The isolation between channels is high, which can effectively prevent gas cross contamination.
High precision pressure and flow control: Equipped with imported high-precision pressure regulators (such as Swagelok and Parker brands), the pressure regulation range covers 0.1-10 bar, with a regulation accuracy of ± 0.5% FS (full range), which can stabilize the input gas pressure within the precise range required by the process and avoid pressure fluctuations affecting process stability; At the same time, each channel is compatible with Mass Flow Controller (MFC), supporting a flow range of 0-500 sccm (standard milliliters/minute) and a flow control accuracy of ± 1% FS, achieving real-time and precise control of gas flow.
Multi level gas purification and filtration: Each gas channel is equipped with a three-stage filtration unit, with the first stage being a 5 μ m coarse filter to filter out large particle impurities in the gas; The second level is a 0.1 μ m precision filter that removes small particles; The third level is a chemical adsorption filter that can adsorb moisture (dew point ≤ -80 ℃), oxygen (content ≤ 1ppb), and organic impurities in the gas, ensuring that the output gas purity reaches 99.9999% (6N level) or above, meeting the requirements of advanced semiconductor processes (such as 7nm and below) for gas cleanliness.
AMAT Applied Materials 0010-99060氣體面板 產(chǎn)品展示
產(chǎn)品視頻
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| 6ES5470-7LB13 | CACR-SR05BB1BF | 6SC6101-2B-Z |
| 6ES5470-7LB12 | CONTROLLER | TSX3721101 |
| 6ES5470-7LA13 | CACR-SR03SB1AF | TSX07301012 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
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