AMAT Applied Materials 0010-13143射頻模塊組件
1.產(chǎn) 品 資 料 介 紹：
類別 | 規(guī)格 |
射頻特性 | 工作頻段 13.56MHz±0.1%，輸出功率 0-1500W 可調(diào) |
信號性能 | 調(diào)制方式支持 ASK/FSK，接收靈敏度≤-120dBm，功率精度 ±1% FS |
控制接口 | 集成 RS-485 通訊接口、2 路數(shù)字 I/O 控制端 |
環(huán)境適配 | -10-65℃、濕度＜80% 無冷凝、抗 EMI 干擾（EN 61000-6-2） |
安全特性 | 過功率保護（1.2 倍額定值）、過溫保護（75℃觸發(fā)）、射頻泄漏報警 |
兼容性 | 兼容 AMAT 0100-66025 控制模塊、0041-78374 射頻匹配組件、0100-02839 機架組件 |
- 等離子體激勵供電：向刻蝕機反應腔輸出穩(wěn)定射頻能量，激勵工藝氣體電離形成等離子體，通過功率調(diào)節(jié)控制等離子體密度，適配 14nm 及以下制程需求。
- 工藝信號反饋調(diào)節(jié)：接收射頻匹配組件的反射功率信號（閾值≤5% 入射功率），經(jīng)內(nèi)部電路解調(diào)后傳輸至控制模塊，實現(xiàn)輸出功率毫秒級動態(tài)補償。
- 設備安全聯(lián)鎖響應：與射頻互鎖模塊（如 0100-35565）聯(lián)動，當檢測到腔體泄漏或門體未關(guān)時，0.05s 內(nèi)切斷射頻輸出并觸發(fā)報警，符合 SEMI S8 安全標準。
AMAT Applied Materials 0010-13143射頻模塊組件 英文資料：
1、 Core positioning
AMAT 0010-13143 is the "RF signal center" of semiconductor plasma technology, integrating transmission module, reception module, and control circuit. It is responsible for converting control instructions into stable RF energy output to the reaction chamber, while receiving feedback signals to achieve dynamic power adjustment. It adopts anti-interference shielding design and high-precision modulation technology, adapts to Class 100 clean environment and 13.56MHz mainstream process frequency band, and ensures the plasma stability of core processes such as etching and deposition.
2、 Key parameters
Category
Specifications
RF characteristics
Working frequency band 13.56MHz ± 0.1%, output power adjustable from 0-1500W
Signal performance
Modulation method supports ASK/FSK, receiving sensitivity ≤ -120dBm, power accuracy ± 1% FS
Control interface
Integrated RS-485 communication interface, 2-channel digital I/O control terminal
Environmental adaptation
-10-65 ℃, humidity<80%, no condensation, anti EMI interference (EN 61000-6-2)
Security features
Overpower protection (1.2 times rated value), over temperature protection (triggered at 75 ℃), RF leakage alarm
Compatibility
Compatible with AMAT 0100-66025 control module, 0041-78374 RF matching component, 0100-02839 rack component
3、 Core applications
Plasma excitation power supply: outputting stable RF energy to the reaction chamber of the etching machine, exciting the ionization of process gas to form plasma, controlling the plasma density through power regulation, and adapting to process requirements of 14nm and below.
Process signal feedback adjustment: Receive the reflected power signal of the RF matching component (threshold ≤ 5% incident power), demodulate it through internal circuits, and transmit it to the control module to achieve millisecond level dynamic compensation of output power.
Equipment safety interlock response: In conjunction with the RF interlock module (such as 0100-35565), when a cavity leak or door failure is detected, the RF output is cut off and an alarm is triggered within 0.05 seconds, in compliance with SEMI S8 safety standards.
AMAT Applied Materials 0010-13143射頻模塊組件 產(chǎn)品展示
產(chǎn)品視頻
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
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