AMAT Applied Materials  0190-09445 檢測(cè)器

1.產(chǎn) 品 資 料 介 紹：

AMAT Applied Materials 0190-09445 檢測(cè)器 英文資料：

Application scenarios and adaptation systems

1. Core application areas

As a "precision monitoring eye" for device status, this detector mainly serves the key links in semiconductor manufacturing that require real-time monitoring of multiple parameters:

RF system status monitoring: Installed in the RF path between the AMAT 0041-78374 RF matching component and the reaction chamber, real-time detection of RF reflected power. When the reflected power exceeds the threshold (such as>5W), an alarm signal is immediately sent to the controller to trigger the matching component to readjust the impedance, avoiding damage to the RF power supply or plasma stability caused by excessive reflected power.

Plasma process monitoring: Align the plasma area inside the reaction chamber through a sapphire window and collect plasma intensity signals (such as the 703nm characteristic spectrum of CF ? plasma in etching process). The controller analyzes the plasma density through changes in light intensity, dynamically adjusts parameters such as RF power and gas flow rate, and ensures consistency in etching rate and thin film deposition quality.

Chamber environment safety monitoring: During the maintenance process of the reaction chamber, the residual plasma intensity inside the chamber is monitored. When the intensity drops below the safety threshold (<1 μ W/cm 2), maintenance personnel are allowed to open the chamber to prevent residual plasma from causing harm to personnel; Simultaneously monitor the temperature of the chamber wall (through built-in temperature sensing elements) to avoid excessive temperature that may cause aging of chamber components.

Equipment fault warning: Long term monitoring of RF power fluctuations and plasma intensity stability, predicting potential faults in advance through data trend analysis (such as RF cable aging, matching component capacitance performance degradation), triggering preventive maintenance reminders, and reducing unplanned downtime.

2. Adapt devices and systems

Host device adaptation: widely used in semiconductor devices such as AMAT Centura etching system, Endura deposition platform, Producer thin film deposition equipment, and ion implantation machines that rely on RF and plasma processes.

Compatibility with supporting modules: Directly interface with AMAT 0190 series RF components, 0225 series controllers, 0100 series electronic interface modules, and third-party data acquisition systems (such as NI cDAQ series) to form a closed-loop monitoring system of "detection signal transmission analysis control".

Collaborative component linkage: It can be linked with the Device Health Management System (PHM) to compare real-time detection data with historical data, identify abnormal patterns (such as increased RF power fluctuation frequency) through algorithms, automatically generate fault diagnosis reports, and assist operation and maintenance personnel in accurately locating problems.

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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