AMAT  0010-09301節(jié)流閥組件

1.產 品 資 料 介 紹：

AMAT 0010-09301 節(jié)流閥組件

產品概述

AMAT（Applied Materials）0010-09301 節(jié)流閥組件是一種用于半導體制造設備的氣體或液體流量控制模塊。通過調節(jié)閥門開度，實現(xiàn)對流體流量或壓力的精確控制，確保設備內部工藝參數(shù)（如腔體壓力、氣體流量或液體冷卻流量）保持穩(wěn)定。該組件廣泛應用于沉積、刻蝕及氣動系統(tǒng)中，是實現(xiàn)工藝精度和設備安全的重要執(zhí)行單元。

技術參數(shù)（典型方向，具體數(shù)據(jù)需參考原廠資料）

• 控制方式：手動或自動驅動，可通過氣動/電子信號調節(jié)

• 適用介質：工藝氣體、冷卻液或惰性氣體

• 流量范圍：根據(jù)工藝需求設計，可實現(xiàn)微調控制

• 壓力范圍：適應設備工藝腔體或管路的工作壓力

• 接口：兼容 AMAT 系統(tǒng)管路及控制接口

• 環(huán)境適應性：潔凈室兼容，耐腐蝕和高溫

• 安裝方式：模塊化安裝，便于集成和維護

應用場景

1. 沉積工藝（CVD/PVD/ALD）

   • 精確控制反應腔體氣體流量或壓力

   • 保證薄膜沉積均勻性和工藝重復性

2. 刻蝕工藝設備

   • 調節(jié)刻蝕腔體的氣體流量或壓力，維持刻蝕精度

   • 與射頻功率模塊和傳感器協(xié)同工作

3. 冷卻與氣動系統(tǒng)

   • 控制冷卻液或輔助氣體流量

   • 保護電子模塊或腔體組件，防止過壓或過流

4. 設備維護與調試

   • 提供可調節(jié)的閥門控制，便于工藝參數(shù)調試和設備維護

AMAT  0010-09301節(jié)流閥組件 英文資料：

AMAT 0010-09301 Throttle Valve Component

Product Overview

AMAT (Applied Materials) 0010-09301 throttle valve assembly is a gas or liquid flow control module used in semiconductor manufacturing equipment. By adjusting the valve opening, precise control of fluid flow or pressure can be achieved to ensure stable internal process parameters of the equipment, such as chamber pressure, gas flow rate, or liquid cooling flow rate. This component is widely used in deposition, etching, and pneumatic systems, and is an important execution unit for achieving process accuracy and equipment safety.

Technical parameters (typical direction, specific data should refer to the original factory information)

Control mode: manual or automatic drive, adjustable through pneumatic/electronic signals

Applicable medium: process gas, coolant or inert gas

Flow range: Designed according to process requirements, can achieve fine tuning control

Pressure range: Suitable for the working pressure of equipment process chambers or pipelines

Interface: Compatible with AMAT system pipelines and control interfaces

Environmental adaptability: cleanroom compatibility, corrosion resistance, and high temperature resistance

Installation method: Modular installation, easy to integrate and maintain

Application scenarios

Deposition process (CVD/PVD/ALD)

Accurately control the gas flow rate or pressure in the reaction chamber

Ensure the uniformity of thin film deposition and process repeatability

Etching process equipment

Adjust the gas flow rate or pressure in the etching chamber to maintain etching accuracy

Collaborate with RF power modules and sensors

Cooling and Pneumatic System

Control the flow of coolant or auxiliary gas

Protect electronic modules or cavity components from overvoltage or overcurrent

Equipment maintenance and debugging

Provide adjustable valve control for easy process parameter tuning and equipment maintenance

AMAT 0010-09301節(jié)流閥組件 產品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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