AMAT Applied Materials  0010-90811控制器模塊

1.產(chǎn) 品 資 料 介 紹：

產(chǎn)品概述

AMAT 0010-90811 控制器模塊是 Applied Materials 半導(dǎo)體制造設(shè)備中的關(guān)鍵部件，主要用于 氣體供應(yīng)與工藝控制系統(tǒng)。該模塊通過精確的氣體流量、壓力和閥門狀態(tài)調(diào)節(jié)，確保腔體環(huán)境滿足工藝要求。它廣泛應(yīng)用于刻蝕、沉積、離子注入等核心工藝環(huán)節(jié)，對(duì)保證半導(dǎo)體制造的一致性和高良率起到重要作用。

技術(shù)參數(shù)（推斷類信息，具體數(shù)值因未公開可能略有差異）

• 功能類型：氣體控制器模塊

• 控制對(duì)象：工藝氣體（如 BF?、高純工藝氣體等）

• 輸入電源：通常為低壓直流供電（24V DC 常見）

• 信號(hào)接口：支持與上位系統(tǒng)控制器（PLC 或 AMAT 專用主控系統(tǒng)）通信

• 監(jiān)測(cè)功能：壓力、閥門狀態(tài)、流量反饋

• 控制模式：閉環(huán)控制，支持快速響應(yīng)與高精度調(diào)節(jié)

• 設(shè)計(jì)特性：耐高純氣體腐蝕、適應(yīng)潔凈室真空工藝環(huán)境

應(yīng)用場(chǎng)景

1. 半導(dǎo)體工藝氣體供給

   • 精確調(diào)節(jié)工藝氣體流量，用于 CVD、PVD、刻蝕、離子注入等工藝。

2. 真空腔體環(huán)境控制

   • 在真空工藝腔中調(diào)節(jié)氣體壓力與比例，確保工藝穩(wěn)定運(yùn)行。

3. 安全與保護(hù)

   • 提供氣體狀態(tài)監(jiān)控（流量、壓力、閥門位置），在異常情況時(shí)觸發(fā)保護(hù)措施。

4. 工藝精度與一致性

   • 實(shí)現(xiàn)閉環(huán)反饋，保持氣體參數(shù)穩(wěn)定，確保晶圓加工質(zhì)量一致。

產(chǎn)品優(yōu)勢(shì)

• 高精度控制：確保氣體流量和壓力穩(wěn)定，提升工藝良率。

• 高可靠性：經(jīng)過 AMAT 嚴(yán)格認(rèn)證，適配半導(dǎo)體潔凈室環(huán)境。

• 快速響應(yīng)：能快速調(diào)整氣體狀態(tài)，滿足復(fù)雜工藝的動(dòng)態(tài)需求。

• 安全保障：內(nèi)置狀態(tài)監(jiān)控與異常保護(hù)功能，提高設(shè)備運(yùn)行安全性。

• 模塊化設(shè)計(jì)：作為 AMAT 設(shè)備的標(biāo)準(zhǔn)化控制模塊，方便更換與維護(hù)。

AMAT Applied Materials 0010-90811控制器模塊 英文資料：

Product Overview

The AMAT 0010-90811 controller module is a key component in Applied Materials semiconductor manufacturing equipment, mainly used for gas supply and process control systems. This module ensures that the chamber environment meets process requirements through precise adjustment of gas flow rate, pressure, and valve status. It is widely used in core processes such as etching, deposition, and ion implantation, playing an important role in ensuring consistency and high yield in semiconductor manufacturing.

Technical parameters (inferential information, specific values may vary slightly due to undisclosed information)

Function type: Gas controller module

Control object: Process gases (such as BF ∝, high-purity process gases, etc.)

Input power supply: usually low voltage DC power supply (24V DC is common)

Signal interface: supports communication with the upper system controller (PLC or AMAT dedicated main control system)

Monitoring function: pressure, valve status, flow feedback

Control mode: closed-loop control, supporting fast response and high-precision adjustment

Design features: resistant to high-purity gas corrosion, adaptable to clean room vacuum process environment

Application scenarios

Semiconductor process gas supply

Accurately adjust the process gas flow rate for CVD, PVD, etching, ion implantation and other processes.

Vacuum chamber environment control

Adjust the gas pressure and proportion in the vacuum process chamber to ensure the stable operation of the process.

Security and protection

Provide gas status monitoring (flow rate, pressure, valve position) and trigger protective measures in case of abnormal situations.

Process accuracy and consistency

Implement closed-loop feedback, maintain stable gas parameters, and ensure consistent wafer processing quality.

Product advantages

High precision control: Ensure stable gas flow and pressure, and improve process yield.

High reliability: certified by AMAT and suitable for semiconductor cleanroom environments.

Quick response: able to quickly adjust the gas state to meet the dynamic requirements of complex processes.

Security guarantee: Built in status monitoring and abnormal protection functions improve the safety of device operation.

Modular design: As a standardized control module for AMAT equipment, it is easy to ｒｅｐｌａｃｅ and maintain.

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