AMAT 0090-10396射頻濾波器箱

1.產(chǎn) 品 資 料 介 紹：

AMAT 0090-10396 射頻濾波器箱

產(chǎn)品概述

AMAT（Applied Materials）0090-10396 射頻濾波器箱是一種專用于半導(dǎo)體制造設(shè)備的電子模塊，主要用于射頻（RF）信號的濾波與調(diào)節(jié)。它可以抑制不必要的頻率干擾，保證射頻功率的純凈和穩(wěn)定輸出，從而提高等離子體源或射頻驅(qū)動模塊的性能。該模塊通常應(yīng)用于沉積、刻蝕等需要射頻控制的工藝設(shè)備中。

技術(shù)參數(shù)（典型方向，具體數(shù)據(jù)需參考原廠資料）

• 濾波類型：射頻信號帶通/低通/高通濾波，降低噪聲和干擾

• 工作頻率范圍：根據(jù)工藝要求的射頻信號規(guī)格

• 接口：輸入/輸出射頻信號端口，兼容 AMAT RF 控制模塊

• 信號特性：低插入損耗、高隔離度，保證信號質(zhì)量

• 環(huán)境適應(yīng)性：高潔凈度、低電磁干擾環(huán)境

• 結(jié)構(gòu)：模塊化設(shè)計，便于設(shè)備集成和維護(hù)

應(yīng)用場景

1. 沉積工藝（PVD/CVD/ALD）

   • 對射頻電源輸出進(jìn)行濾波，確保等離子體功率穩(wěn)定

   • 提高薄膜沉積的均勻性和工藝重復(fù)性

2. 刻蝕工藝設(shè)備

   • 抑制射頻信號中的雜散頻率，避免對腔體等離子體產(chǎn)生干擾

   • 精確控制刻蝕速率和工藝輪廓

3. 等離子體源與射頻驅(qū)動系統(tǒng)

   • 對射頻信號進(jìn)行凈化和匹配，提高功率傳輸效率

   • 保證多模塊射頻同步和穩(wěn)定性

4. 設(shè)備維護(hù)與升級

   • 可更換模塊化濾波器箱，支持設(shè)備性能優(yōu)化和信號調(diào)試

AMAT0090-10396射頻濾波器箱  英文資料：

AMAT 0090-10396 RF Filter Box

Product Overview

AMAT (Applied Materials) 0090-10396 RF filter box is an electronic module specifically designed for semiconductor manufacturing equipment, mainly used for filtering and adjusting RF signals. It can suppress unnecessary frequency interference, ensure the purity and stable output of RF power, thereby improving the performance of plasma sources or RF drive modules. This module is typically used in process equipment that requires RF control, such as deposition and etching.

Technical parameters (typical direction, specific data should refer to the original factory information)

Filter type: RF signal bandpass/low-pass/high pass filtering, reducing noise and interference

Working frequency range: RF signal specifications according to process requirements

Interface: Input/output RF signal port, compatible with AMAT RF control module

Signal characteristics: low insertion loss, high isolation, ensuring signal quality

Environmental adaptability: high cleanliness, low electromagnetic interference environment

Structure: Modular design for easy integration and maintenance of equipment

Application scenarios

Deposition process (PVD/CVD/ALD)

Filter the RF power output to ensure stable plasma power

Improve the uniformity and process repeatability of thin film deposition

Etching process equipment

Suppress stray frequencies in RF signals to avoid interference with the cavity plasma

Accurate control of etching rate and process profile

Plasma source and RF drive system

Purification and matching of RF signals to improve power transmission efficiency

Ensure multi module RF synchronization and stability

Equipment maintenance and upgrade

Replaceable modular filter box, supporting equipment performance optimization and signal debugging

AMAT 0090-10396射頻濾波器箱 產(chǎn)品展示      

 產(chǎn)品視頻

3.其他產(chǎn)品

Nabtesco BTC-304推進(jìn)器
3BHE023784R1023 PPD113 B01-10-150000 邏輯控制器模塊
500CPU03 1HDF700003R5122 控制模塊

4.其他英文產(chǎn)品

Mitsubishi A1SJ51T64 main communication module
HE693ADC409A-22 industrial module
SE3008 KJ2005X1-SQ1 12P6383X032 controller

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218