AMAT  0015-09091相位角轉(zhuǎn)換器

1.產(chǎn) 品 資 料 介 紹：

AMAT 0015-09091 相位角轉(zhuǎn)換器

產(chǎn)品概述

AMAT（Applied Materials）0015-09091 相位角轉(zhuǎn)換器是一種電子信號處理模塊，主要用于半導(dǎo)體設(shè)備中對交流信號或工藝相關(guān)信號的相位調(diào)整和同步處理。它可以將輸入信號的相位轉(zhuǎn)換為設(shè)備所需的參考相位，從而保證多路設(shè)備或工藝子系統(tǒng)間的同步運行。該模塊在等離子體發(fā)生器、射頻功率控制或其他需要精確相位控制的工藝系統(tǒng)中應(yīng)用廣泛。

技術(shù)參數(shù)（典型方向，具體數(shù)據(jù)需參考原廠資料）

• 輸入信號類型：交流信號或特定工藝參考信號

• 相位控制范圍：0°–360°可調(diào)，支持連續(xù)或離散調(diào)節(jié)

• 輸出信號：與輸入信號相位調(diào)整后的同步信號

• 精度：高精度相位轉(zhuǎn)換，誤差低于數(shù)度

• 工作環(huán)境：適應(yīng)半導(dǎo)體設(shè)備高潔凈、低噪聲電磁環(huán)境

• 接口：兼容 AMAT 工藝設(shè)備控制系統(tǒng)

應(yīng)用場景

1. 等離子體發(fā)生器控制

   • 調(diào)整射頻信號相位，確保等離子體功率分布均勻，優(yōu)化刻蝕或沉積工藝。

2. 射頻功率同步

   • 多路射頻模塊或功率源之間的相位匹配，保證功率輸出協(xié)調(diào)一致。

3. 沉積工藝（CVD/PVD）

   • 在多源沉積或交替工藝中，通過相位控制優(yōu)化薄膜均勻性。

4. 刻蝕工藝

   • 通過相位調(diào)整控制等離子體輪廓和刻蝕速率，實現(xiàn)精細(xì)圖案加工。

5. 工藝設(shè)備信號同步

   • 設(shè)備間或子模塊間的信號協(xié)調(diào)，確保多系統(tǒng)同時啟動或停止，避免工藝干擾。

6. 實驗與研發(fā)平臺

   • 支持新工藝開發(fā)中對相位敏感參數(shù)的調(diào)節(jié)與驗證。

AMAT  0015-09091相位角轉(zhuǎn)換器 英文資料：

AMAT 0015-09091 Phase Angle Converter

Product Overview

AMAT (Applied Materials) 0015-09091 phase angle converter is an electronic signal processing module mainly used for phase adjustment and synchronization processing of AC signals or process related signals in semiconductor equipment. It can convert the phase of the input signal into the reference phase required by the device, thereby ensuring synchronous operation between multiple devices or process subsystems. This module is widely used in plasma generators, RF power control, or other process systems that require precise phase control.

Technical parameters (typical direction, specific data should refer to the original factory information)

Input signal type: AC signal or specific process reference signal

Phase control range: adjustable from 0 ° to 360 °, supporting continuous or discrete adjustment

Output signal: synchronized signal after phase adjustment with the input signal

Accuracy: High precision phase conversion, with errors below a few degrees

Work environment: Suitable for semiconductor equipment with high cleanliness and low noise electromagnetic environment

Interface: Compatible with AMAT process equipment control system

Application scenarios

Plasma generator control

Adjust the phase of the RF signal to ensure uniform plasma power distribution and optimize the etching or deposition process.

RF power synchronization

Phase matching between multiple RF modules or power sources ensures coordinated and consistent power output.

Deposition process (CVD/PVD)

Optimizing film uniformity through phase control in multi-source sedimentation or alternating processes.

etching process

By adjusting the phase to control the plasma profile and etching rate, fine pattern processing can be achieved.

Synchronization of process equipment signals

Signal coordination between equipment or submodules ensures that multiple systems start or stop simultaneously, avoiding process interference.

Experimental and R&D platform

Support the adjustment and validation of phase sensitive parameters in the development of new processes.

AMAT  0015-09091相位角轉(zhuǎn)換器 產(chǎn)品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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