AMAT 0010-77681控制箱系統(tǒng)
1.產(chǎn) 品 資 料 介 紹:
AMAT 0010-77681 控制箱系統(tǒng)
產(chǎn)品概述
AMAT(Applied Materials)0010-77681 控制箱系統(tǒng)是半導體制造設備的集中控制單元,通常包含電源模塊、控制器、接口電路和必要的安全保護組件。它作為設備電子與電氣系統(tǒng)的核心樞紐,負責向各子模塊(如氣體閥門、加熱器、探測器板、驅(qū)動模塊等)分配電源、傳輸控制信號,并實現(xiàn)設備的集中監(jiān)控和管理。
技術參數(shù)(典型方向,具體數(shù)據(jù)需參考原廠資料)
系統(tǒng)類型:集成電源、控制與信號分配的機箱系統(tǒng)
輸入電源:工業(yè)標準 AC 電源,支持多路電壓輸出
接口類型:多路數(shù)字/模擬 I/O,支持與設備內(nèi)部控制器、傳感器、執(zhí)行器連接
安全功能:過載保護、過壓保護、短路防護和互鎖邏輯
適配平臺:適用于 AMAT 多種沉積、刻蝕、離子注入及相關半導體工藝設備
應用場景
沉積工藝(CVD/PVD/ALD)
為腔體加熱器、氣體閥門、泵浦及探測器模塊提供穩(wěn)定電源和控制信號。
協(xié)調(diào)各子系統(tǒng)運行,保證薄膜沉積均勻性和工藝穩(wěn)定性。
刻蝕工藝設備
控制射頻功率模塊、氣體流量和壓力傳感器的工作,實現(xiàn)精確刻蝕過程控制。
離子注入系統(tǒng)
負責離子源、掃描系統(tǒng)及束流監(jiān)測模塊的電源和信號管理,保證劑量與均勻性。
氣體與真空系統(tǒng)控制
集中管理閥門、流量計、真空泵和壓力傳感器,維持腔體環(huán)境穩(wěn)定。
工廠自動化與安全聯(lián)鎖
實現(xiàn)設備與上位監(jiān)控系統(tǒng)的接口,執(zhí)行互鎖、報警和安全保護邏輯。
研發(fā)與實驗室工藝驗證
提供模塊化、可擴展的電氣控制平臺,支持新工藝開發(fā)和實驗驗證。
AMAT 0010-77681控制箱系統(tǒng) 英文資料:
AMAT 0010-77681 Control Box System
Product Overview
The AMAT (Applied Materials) 0010-77681 control box system is a centralized control unit for semiconductor manufacturing equipment, typically consisting of power modules, controllers, interface circuits, and necessary safety protection components. As the core hub of electronic and electrical systems, it is responsible for distributing power to various sub modules (such as gas valves, heaters, detector boards, drive modules, etc.), transmitting control signals, and achieving centralized monitoring and management of equipment.
Technical parameters (typical direction, specific data should refer to the original factory information)
System type: Integrated power, control, and signal distribution chassis system
Input power supply: Industrial standard AC power supply, supporting multiple voltage outputs
Interface type: Multi channel digital/analog I/O, supporting connection with internal controllers, sensors, and actuators of the device
Safety functions: overload protection, overvoltage protection, short circuit protection, and interlock logic
Adaptation Platform: Suitable for various deposition, etching, ion implantation, and related semiconductor process equipment in AMAT
Application scenarios
Deposition process (CVD/PVD/ALD)
Provide stable power and control signals for chamber heaters, gas valves, pumps, and detector modules.
Coordinate the operation of various subsystems to ensure the uniformity of thin film deposition and process stability.
Etching process equipment
Control the operation of the RF power module, gas flow rate, and pressure sensor to achieve precise etching process control.
Ion implantation system
Responsible for power and signal management of ion sources, scanning systems, and beam monitoring modules to ensure dose and uniformity.
Gas and vacuum system control
Centralize the management of valves, flow meters, vacuum pumps, and pressure sensors to maintain a stable chamber environment.
Factory automation and safety interlocking
Implement the interface between the device and the upper monitoring system, and execute interlocking, alarm, and security protection logic.
R&D and laboratory process validation
Provide a modular and scalable electrical control platform that supports new process development and experimental validation.
AMAT 0010-77681控制箱系統(tǒng) 產(chǎn)品展示

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218



