AMAT  0010-70162控制器

1.產(chǎn) 品 資 料 介 紹：

AMAT 0010-70162 控制器

產(chǎn)品概述

AMAT（Applied Materials）0010-70162 控制器是一款用于半導體制造設備的專用控制模塊，主要承擔設備運行參數(shù)的監(jiān)控、執(zhí)行邏輯的處理以及外圍部件的協(xié)調(diào)控制任務。該控制器在 AMAT 的沉積、刻蝕、離子注入等工藝設備中扮演“大腦”的角色，通過高速信號處理與邏輯判斷，實現(xiàn)對工藝過程的精準控制與安全管理。

技術(shù)參數(shù)（典型方向，具體參數(shù)需參考原廠文檔）

• 控制邏輯：支持多任務并行處理，具備實時工藝控制能力

• 接口類型：支持多種模擬/數(shù)字 I/O 接口、總線接口，便于與傳感器、執(zhí)行器、上位機通訊

• 處理性能：工業(yè)級嵌入式處理器，適合長時間高負荷運作

• 安全機制：內(nèi)置故障檢測和互鎖保護邏輯

• 適配性：專為 AMAT 半導體工藝設備平臺定制

應用場景

1. 沉積設備控制

   • 在 CVD、PVD、ALD 等工藝設備中，用于管理腔體溫度、氣體流量、等離子體功率等關(guān)鍵參數(shù)。

   • 確保薄膜沉積的均勻性與重復性。

2. 刻蝕系統(tǒng)

   • 監(jiān)測和調(diào)節(jié)反應腔體的氣體比例、真空度、RF 功率，保障刻蝕速率與輪廓精度。

   • 實現(xiàn)刻蝕工藝中對參數(shù)的實時反饋與快速修正。

3. 離子注入設備

   • 控制束流能量、角度及掃描過程，確保離子注入的均勻性與器件特性穩(wěn)定。

4. 工藝氣體與真空系統(tǒng)

   • 作為氣體面板、真空泵、閥門等執(zhí)行單元的集中控制核心，協(xié)調(diào)運行邏輯。

5. 工廠自動化與聯(lián)鎖保護

   • 在晶圓廠自動化環(huán)境中，控制器可與中央監(jiān)控系統(tǒng)通信，執(zhí)行互鎖與聯(lián)動保護。

   • 避免工藝異常、硬件故障導致的生產(chǎn)中斷。

6. 研發(fā)與實驗室應用

   • 用于新工藝開發(fā)和實驗平臺，支持多變量實驗參數(shù)的調(diào)節(jié)與記錄。

AMAT  0010-70162控制器 英文資料：

AMAT 0010-70162 Controller

Product Overview

The AMAT (Applied Materials) 0010-70162 controller is a specialized control module used in semiconductor manufacturing equipment, mainly responsible for monitoring equipment operating parameters, processing execution logic, and coordinating control tasks of peripheral components. This controller plays the role of the "brain" in AMAT's deposition, etching, ion implantation and other process equipment, achieving precise control and safety management of the process through high-speed signal processing and logical judgment.

Technical parameters (typical direction, specific parameters need to refer to the original factory documentation)

Control logic: Supports multitasking parallel processing and has real-time process control capability

Interface type: Supports multiple analog/digital I/O interfaces and bus interfaces, facilitating communication with sensors, actuators, and upper computers

Processing performance: Industrial grade embedded processor, suitable for long-term high load operation

Security mechanism: Built in fault detection and interlock protection logic

Adaptability: Customized for AMAT semiconductor process equipment platform

Application scenarios

Sedimentation equipment control

Used in CVD, PVD, ALD and other process equipment to manage key parameters such as chamber temperature, gas flow rate, plasma power, etc.

Ensure the uniformity and repeatability of thin film deposition.

Etching system

Monitor and adjust the gas ratio, vacuum degree, and RF power of the reaction chamber to ensure etching rate and contour accuracy.

Realize real-time feedback and rapid correction of parameters in etching process.

Ion implantation equipment

Control the beam energy, angle, and scanning process to ensure the uniformity of ion implantation and stable device characteristics.

Process gas and vacuum system

As the centralized control core of execution units such as gas panels, vacuum pumps, valves, etc., it coordinates the operation logic.

Factory automation and interlocking protection

In the wafer fab automation environment, the controller can communicate with the central monitoring system to perform interlocking and linkage protection.

To avoid production interruptions caused by process abnormalities or hardware failures.

Research and laboratory applications

Used for new process development and experimental platform, supporting the adjustment and recording of multivariate experimental parameters.

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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