MKS EDGE3013A發(fā)電機(jī)

1.產(chǎn) 品 資 料 介 紹：

中文資料：

MKS EDGE3013A 發(fā)生器（RF Generator）是一款 13.56MHz 射頻功率發(fā)生器，主要用于 精密等離子體處理和半導(dǎo)體制造 等高端工業(yè)應(yīng)用。其主要應(yīng)用領(lǐng)域包括：

1. 半導(dǎo)體制造

• 等離子體蝕刻（Plasma Etching）：用于精細(xì)圖形化加工，如刻蝕硅片、金屬或介質(zhì)層。
• 化學(xué)氣相沉積（CVD/PECVD）：支持薄膜沉積，提高膜層質(zhì)量和均勻性。
• 離子注入（Ion Implantation）：通過 RF 控制等離子體，實(shí)現(xiàn)離子摻雜過程。

2. 太陽能光伏（Photovoltaics）

• 薄膜太陽能電池制造：如硅薄膜（a-Si）、CIGS、CdTe等光伏電池的等離子體增強(qiáng)沉積（PECVD）。
• 晶硅太陽能電池蝕刻和表面鈍化：提高光吸收效率和轉(zhuǎn)換效率。

3. 顯示面板制造（Flat Panel Display, FPD）

• 液晶顯示（LCD）、有機(jī)發(fā)光二極管（OLED） 生產(chǎn)中薄膜沉積和刻蝕。
• AMOLED 和 Micro-LED 生產(chǎn)過程中的精密刻蝕及圖形化。

4. LED & 微電子制造

• 用于 LED 制造過程中的等離子體蝕刻、PECVD 和干法刻蝕工藝，確保高效能和高精度的 LED 芯片加工。

5. 先進(jìn)材料處理

• 等離子體表面改性：改變材料表面能，提高附著力和潤濕性（如醫(yī)療設(shè)備涂層、航空航天材料處理）。
• 納米材料處理：用于碳納米管（CNT）、石墨烯等先進(jìn)材料的合成和修飾。

6. 醫(yī)療和生物技術(shù)

• 生物材料表面改性：優(yōu)化生物傳感器、植入物、微流體器件等材料的生物相容性。
• 醫(yī)療設(shè)備制造：如透析膜、導(dǎo)管等的等離子表面處理，提高性能。

7. 工業(yè)鍍膜

• 功能性涂層：如防指紋涂層、防反射涂層、硬化涂層，應(yīng)用于玻璃、塑料和金屬表面處理。
• 光學(xué)鍍膜：用于濾光片、激光元件、眼鏡片制造。

8. 通信 & 電子元件

• RF MEMS 生產(chǎn)：用于制造高性能射頻微機(jī)電系統(tǒng)（RF MEMS），應(yīng)用于 5G、衛(wèi)星通信等領(lǐng)域。
• PCB 制造：高密度互連（HDI）PCB 生產(chǎn)中的等離子清潔和刻蝕。

MKS EDGE3013A 作為高穩(wěn)定性射頻電源，提供精準(zhǔn)的功率控制和穩(wěn)定的射頻輸出，廣泛應(yīng)用于 半導(dǎo)體、光伏、顯示面板、LED 及高科技材料制造等行業(yè)。

英文資料：

The MKS EDGE3013A RF Generator is a 13.56MHz RF power generator primarily used for high-end industrial applications such as precision plasma processing and semiconductor manufacturing. Its main application areas include:

1. Semiconductor manufacturing

Plasma Etching: Used for fine graphic processing, such as etching silicon wafers, metals, or dielectric layers.

Chemical Vapor Deposition (CVD/PECVD): supports thin film deposition to improve film quality and uniformity.

Ion implantation: The process of ion doping is achieved by controlling the plasma through RF.

2. Solar photovoltaics

Manufacturing of thin-film solar cells: plasma enhanced deposition (PECVD) of photovoltaic cells such as silicon thin films (a-Si), CIGS, CdTe, etc.

Etching and surface passivation of crystalline silicon solar cells: improving light absorption efficiency and conversion efficiency.

3. Manufacturing of Flat Panel Display (FPD)

Thin film deposition and etching in the production of liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs).

Precision etching and patterning in the production process of AMOLED and Micro LED.

4. LED&Microelectronics Manufacturing

Used for plasma etching, PECVD, and dry etching processes in LED manufacturing to ensure efficient and high-precision processing of LED chips.

5. Advanced material processing

Plasma surface modification: Changing the surface energy of materials to improve adhesion and wettability (such as medical equipment coatings, aerospace material processing).

Nanomaterial processing: used for the synthesis and modification of advanced materials such as carbon nanotubes (CNTs) and graphene.

6. Medical and Biotechnology

Surface modification of biomaterials: optimizing the biocompatibility of materials such as biosensors, implants, microfluidic devices, etc.

Medical equipment manufacturing: plasma surface treatment of dialysis membranes, catheters, etc. to improve performance.

7. Industrial coating

Functional coatings: such as anti fingerprint coatings, anti reflective coatings, and hardened coatings, applied to surface treatment of glass, plastic, and metal.

Optical coating: used in the manufacturing of optical filters, laser components, and eyeglass lenses.

8. Communication&Electronic Components

RF MEMS production: used for manufacturing high-performance RF microelectromechanical systems (RF MEMS), applied in fields such as 5G and satellite communication.

PCB manufacturing: plasma cleaning and etching in high-density interconnect (HDI) PCB production.

As a highly stable RF power supply, MKS EDGE3013A provides precise power control and stable RF output, and is widely used in industries such as semiconductors, photovoltaics, display panels, LEDs, and high-tech material manufacturing.

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