MKS  0190-40602 遠(yuǎn)程等離子源

1.產(chǎn) 品 資 料 介 紹：

中文資料：

MKS 0190-40602 遠(yuǎn)程等離子源 是 MKS Instruments 提供的一款高效等離子源系統(tǒng)，專為精密的材料處理應(yīng)用設(shè)計，尤其在半導(dǎo)體制造、薄膜沉積、表面處理等工藝中具有廣泛應(yīng)用。它通過遠(yuǎn)程產(chǎn)生等離子體，有效提高了工作效率并提供穩(wěn)定的等離子體源。

主要特點(diǎn)：

1. 穩(wěn)定性高：

   • 該遠(yuǎn)程等離子源提供穩(wěn)定的等離子體生成，確保在各種應(yīng)用中維持高一致性的性能。其穩(wěn)定性對于半導(dǎo)體制造和薄膜沉積等要求嚴(yán)格的工藝非常重要。

2. 高效能：

   • 其設(shè)計使得系統(tǒng)能在低功率下保持高效的等離子體生成，有效降低能量消耗，同時提升等離子體源的工作效率。

3. 遠(yuǎn)程操作：

   • 可以通過遠(yuǎn)程操作控制等離子體生成和調(diào)節(jié)過程，從而減少人為干預(yù)并簡化操作。

4. 低維護(hù)需求：

   • 由于采用了先進(jìn)的設(shè)計和技術(shù)，該遠(yuǎn)程等離子源具有低維護(hù)需求，能顯著減少停機(jī)時間和維護(hù)成本。

5. 靈活性：

   • MKS 0190-40602 具有高靈活性，可根據(jù)不同的應(yīng)用需求調(diào)節(jié)其輸出，適用于各種不同的工業(yè)和科研應(yīng)用。

英文資料：

The MKS 0190-40602 remote plasma source is an efficient plasma source system provided by MKS Instruments, designed specifically for precision material processing applications, particularly in semiconductor manufacturing, thin film deposition, surface treatment, and other processes. It effectively improves work efficiency and provides a stable plasma source by generating plasma remotely.

Main features:

High stability:

This remote plasma source provides stable plasma generation, ensuring high consistency performance in various applications. Its stability is crucial for processes with strict requirements such as semiconductor manufacturing and thin film deposition.

High efficiency:

Its design enables the system to maintain efficient plasma generation at low power, effectively reducing energy consumption while improving the efficiency of the plasma source.

Remote operation:

The plasma generation and regulation process can be controlled remotely, reducing human intervention and simplifying operations.

Low maintenance requirements:

Due to the adoption of advanced design and technology, this remote plasma source has low maintenance requirements and can significantly reduce downtime and maintenance costs.

Flexibility:

MKS 0190-40602 has high flexibility and can adjust its output according to different application needs, suitable for various industrial and scientific research applications.

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