MKS AX7695遠程等離子源

1.產(chǎn) 品 資 料 介 紹：

中文資料：

MKS AX7695 是 MKS Instruments 生產(chǎn)的一款遠程等離子源，主要用于半導(dǎo)體制造過程中提供反應(yīng)性氣體。

主要特點：

• 高性能： 提供高達 6.0 標準升每分鐘（slm）的氧氣或氧氮混合氣體流量，滿足半導(dǎo)體加工對反應(yīng)性氣體的需求。
• 多種氣體供應(yīng)： 支持 100% 氧氣、氬氣或 90% 氧氣/10% 氮氣的點燃氣體供應(yīng)，適應(yīng)不同的工藝要求。
• 集成設(shè)計： 將石英真空腔體、射頻（RF）電源和所有必要的控制功能集成在一個緊湊的自包含單元中，便于直接安裝在工具的工藝腔室上。
• 高可靠性： 設(shè)計用于滿足半導(dǎo)體制造環(huán)境的高要求，具有優(yōu)異的耐用性和穩(wěn)定性。

應(yīng)用領(lǐng)域：

該遠程等離子源廣泛應(yīng)用于半導(dǎo)體制造行業(yè)，特別是在以下工藝中：

• 薄膜沉積： 用于在硅片表面沉積薄膜。
• 刻蝕： 用于在硅片上刻蝕圖案。
• 清洗： 用于清洗硅片表面，去除有機污染物。

維護與更換：

長期使用可能導(dǎo)致模塊性能下降，定期檢查和更換該模塊可以確保工藝過程的穩(wěn)定性和高效運行。

英文資料：

MKS AX7695 is a remote plasma source produced by MKS Instruments, mainly used to provide reactive gases in semiconductor manufacturing processes.

Main features:

High performance: Provides up to 6.0 standard liters per minute (slm) of oxygen or oxygen nitrogen mixed gas flow, meeting the reactive gas requirements for semiconductor processing.

Multiple gas supply: Supports ignition gas supply of 100% oxygen, argon, or 90% oxygen/10% nitrogen to meet different process requirements.

Integrated design: Integrating the quartz vacuum chamber, radio frequency (RF) power supply, and all necessary control functions into a compact self-contained unit, making it easy to install directly on the tool's process chamber.

High reliability: designed to meet the high requirements of semiconductor manufacturing environments, with excellent durability and stability.

Application areas:

This remote plasma source is widely used in the semiconductor manufacturing industry, especially in the following processes:

Thin film deposition: used to deposit thin films on the surface of silicon wafers.

Etching: Used to etch patterns on silicon wafers.

Cleaning: Used to clean the surface of silicon wafers and remove organic pollutants.

Maintenance and replacement:

Long term use may lead to a decrease in module performance. Regular inspection and replacement of the module can ensure the stability and efficient operation of the process.

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